[1825 days] Advances in Research and Development: Modeling of Film Deposition for Microelectronic Applications
[1825 days] Advances in Research and Development: Modeling of Film Deposition for Microelectronic Applications [1825 days] Advances in Research and Development: Modeling of Film Deposition for Microelectronic Applications

[1825 days] Advances in Research and Development: Modeling of Film Deposition for Microelectronic Applications

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CHI TIẾT SẢN PHẨM

Mã sản phẩm:
9780125330237
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Danh mục
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Nhà xuất bản:
Elsevier S & T
Loại bìa:
Page Fidelity
Ngôn ngữ:
English
Tác giả:
Francombe, Maurice H.


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Significant progress has occurred during the last few years in device technologies and these are surveyed in this new volume. Included are Si/(Si-Ge) heterojunctions for high-speed integrated circuits, Schottky-barrier arrays in Si and Si-Ge alloys for infrared imaging, III-V quantum-well detector structures operated in the heterodyne mode for high-data-rate communications, and III-V heterostructures and quantum-wells for infrared emissions.

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