[1825 days] Advances in Research and Development: Modeling of Film Deposition for Microelectronic Applications

[1825 days] Advances in Research and Development: Modeling of Film Deposition for Microelectronic Applications

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CHI TIẾT SẢN PHẨM

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9780125330237

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Elsevier S & T

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Ngôn ngữ:

English

Tác giả:

Francombe, Maurice H.

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Significant progress has occurred during the last few years in device technologies and these are surveyed in this new volume. Included are Si/(Si-Ge) heterojunctions for high-speed integrated circuits, Schottky-barrier arrays in Si and Si-Ge alloys for infrared imaging, III-V quantum-well detector structures operated in the heterodyne mode for high-data-rate communications, and III-V heterostructures and quantum-wells for infrared emissions.

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[1825 days] Advances in Research and Development: Modeling of Film Deposition for Microelectronic Applications

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